Cluster system for Oxide and Metal sputtering

Cluster system for Oxide and Metal sputtering


Negotiable Min Order Quantity Unit

Required Quantity
Place of Origin
Payment Terms
Negotiable
Production method
Negotiable
Shipping / Lead Time
Negotiable / Negotiable
Keyword
pvd, sputter, magnetron sputter
Category
Other Machinery & Industry Equipment

A-Tech System, Inc.

Country / Year Established
South Korea South Korea /
Business type
Others
Verified Certificate

12

DUNS

Product name Cluster system for Oxide and Metal sputtering Certification -
Category Other Machinery & Industry Equipment Ingredients -
Keyword pvd , sputter , magnetron sputter Unit Size -
Brand name - Unit Weigh -
origin Stock -
Supply type - HS code -

Product Information

Metal, ceramic, and alloy depositions for R&D in OLED fields.

Special Features

Cluster sputtering system for TCO deposition with two sputtering chambers and one glove box.
Robot transfer chamber between chambers and glove box.
Cassette loading type with glass holder.
Three tiltable 8" sputter guns and extra sputter gun ports in each chamber.
Available in multilayer deposition as well as co-deposition.
Automatic control in substrate rotation and substrate to cathode distance.
Precision mask aligner with laser focusing.
Substrate temperature uniformity : <±2% over 200x200 glass.
System operation by PLC-based PC control.

Specifications

Glass Capacity : 5 × 200(mm3)
Dimension : 3,500L × 2,400H × 3,300W(mm3)
Power : AC 220V, three phase for main
RF 3,000W 2set for sputtering
DC 5,000W 2set for sputtering
Heater : SiC coated graphite (Max. 600°C)
Gas : Ar/N2/O2/H2/C2H2
Pump : rotary(1,000l/min) & TMP(400l/s) for transfer chamber
turbo(2,400l/s, 2set) & dry pump(1,900l/min 2 set) for main chamber

B2B Trade

Price (FOB) Negotiable transportation -
MOQ Negotiable Leadtime Negotiable
Payment Options Negotiable Shipping time Negotiable

A-Tech System, Inc.

Country / Year Established
South Korea South Korea /
Business type
Others

12

DUNS

President
Cho, Young Sang
Address
175-25, Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea
Product Category
Machinery & Parts
Company introduction

Developed itmes

- Ion beam source
- Arc source
- Filtered cathodic vacuum arc system and process
- LPCVD for nanotube synthesis
- Silica PECVD system
- UHV(Ultra High Vacuum) sputtering system
- Silica TCP (Transformer Coupled Plasma) etcher
- UHV-sputter system for ferromagnetic multilayers
- Vacuum arc system for nitrides deposition
- In-line system of vacuum arc deposition for protecting PDP
  electrodes
- High vacuum test system for a flat light source evaluation
- Multifunctional standard sputtering system for R&D
- NPPN(New Post Plasma Nitriding) System
- Sputter for polygon mirror applicable to laser printer
- Production scale of arc ion plating (AIP) system
- Ion beam sputter for precision optics
- Production scale of AIP and NPPN systems
- Ion plating system for various coloration
- Pilot scale of arc discharge equipment for CNT transparent electrode
  sputter web coater for flexible display research
- Sputter system for ophthalmic
- Polycrystalline silicon ingot growing equipment
- PECVD system for anti-reflective coatings on solar cell
- PECVD system for graphene deposition
- Al plasma nitriding equipment for mass production with KAITECH
- Equipment of carbon nanotube using electrical arc discharge method
- Graphene PECVD-PVD Cluster equipment

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