Manufacturers are tending to use silicon wafers of larger and larger diameter in the production of semiconductor devices, and the adoption of 300mm (12-inch) wafers is just around the corner. Hitachi Kokusai Electric has developed its ZESTONE-III series of Vertical Diffusion/CVD Systems with the needs of the upcoming 300mm era in mind. The series incorporates key technologies of the VERTEX-III, which has established an excellent performance record with customers around the world, and features exceptional reliability and high throughput with low cost of ownership.

Benefits and Features

• High throughput through 100 sheets batch process of 300mm wafers.
  
• Actualizes excellent yield rate of production line with superb uniformity and low particle
  generation by optimizing process conditions and air flow inside the equipment.
  
• With double batch cassette storage, continuous batch processing is available.
  
• Actualizes highly efficient wafer transfer by 5 wafers/single wafer transfer robot(B-type).
• dditional supplementation of short wafer by wafer counting system is enabled.
  
• SEMI compliant cassette I/O port.
  
• Since side-by-side unit placement is enabled, floor space can be minimized.
  
• CX 3000 tube controller compatible with 8 inch processing system.
  

Specifications