Magnetron Sputter System with 4x6

Magnetron Sputter System with 4x6


Negotiable Min Order Quantity Unit

Required Quantity
Place of Origin
Payment Terms
Negotiable
Production method
Negotiable
Shipping / Lead Time
Negotiable / Negotiable
Keyword
magnetron, pvd, sputter
Category
Other Machinery & Industry Equipment

A-Tech System, Inc.

Country / Year Established
South Korea South Korea /
Business type
Others
Verified Certificate

12

DUNS

Product name Magnetron Sputter System with 4x6 Certification -
Category Other Machinery & Industry Equipment Ingredients -
Keyword magnetron , pvd , sputter Unit Size -
Brand name - Unit Weigh -
origin Stock -
Supply type - HS code -

Product Information

Optical device
Passivation layer
Constantan materials

Special Features

4x6" sputter system for R&D and small scale production.
Excellent thickness uniformity(below +-2.8% for the layer of 228.6 nm in thickness).
Highly smooth surface(RMS roughness of deposited layer: 25 Å).
RF/DC magnetron sputter.
Automatic loading system.
Average throughput Up to 100,000 wafers per year.

Specifications

Wafer capacity : 20 x 4"
Dimension : 1575L X 1269H X 930W (mm3)
Power: AC 1.2kW for sputter source
AC 600W for substrate bias voltage(13.56MHz)
Gas : Ar / O2 / H2
Pump : rotary(980l/min) & turbo(1000l/s)

B2B Trade

Price (FOB) Negotiable transportation -
MOQ Negotiable Leadtime Negotiable
Payment Options Negotiable Shipping time Negotiable

A-Tech System, Inc.

Country / Year Established
South Korea South Korea /
Business type
Others

12

DUNS

President
Cho, Young Sang
Address
175-25, Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea
Product Category
Machinery & Parts
Company introduction

Developed itmes

- Ion beam source
- Arc source
- Filtered cathodic vacuum arc system and process
- LPCVD for nanotube synthesis
- Silica PECVD system
- UHV(Ultra High Vacuum) sputtering system
- Silica TCP (Transformer Coupled Plasma) etcher
- UHV-sputter system for ferromagnetic multilayers
- Vacuum arc system for nitrides deposition
- In-line system of vacuum arc deposition for protecting PDP
  electrodes
- High vacuum test system for a flat light source evaluation
- Multifunctional standard sputtering system for R&D
- NPPN(New Post Plasma Nitriding) System
- Sputter for polygon mirror applicable to laser printer
- Production scale of arc ion plating (AIP) system
- Ion beam sputter for precision optics
- Production scale of AIP and NPPN systems
- Ion plating system for various coloration
- Pilot scale of arc discharge equipment for CNT transparent electrode
  sputter web coater for flexible display research
- Sputter system for ophthalmic
- Polycrystalline silicon ingot growing equipment
- PECVD system for anti-reflective coatings on solar cell
- PECVD system for graphene deposition
- Al plasma nitriding equipment for mass production with KAITECH
- Equipment of carbon nanotube using electrical arc discharge method
- Graphene PECVD-PVD Cluster equipment

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