Slurry Nozzle Gadget for CMP(Chemical mechanical polishing)

  • ◾ Price: Negotiable
  • ◾ MOQ: Negotiable

Slurry Nozzle Gadget for CMP(Chemical mechanical polishing)

  • ◾ Price: Negotiable
  • ◾ MOQ: Negotiable

Specifications

Size - Weight - Stock -
Country of Origin South Korea
Production method Negotiable

Trade Terms

Payment Terms -
Price(FOB) Negotiable MOQ Negotiable
Transportation -
Lead time Negotiable Shipping time Negotiable

Company

  • Country / Year Established
    • South Korea
    • South Korea /
  • Membership
    • VIP
    Business type
    Others
  • Verified Certificate
    • 18

Product Description

Slurry Nozzle Gadget for CMP(Chemical mechanical polishing)
Slurry Nozzle Gadget for CMP(Chemical mechanical polishing)

< A NEWLY IMPROVED SLURRY REDUCTION NOZZLE GADGET IN 

   THE POLISHING PROCESS OF THE SEMICONDUCTOR > 

 

1) COST SAVED FOR THE CUSTOMERS SLURRY USAGE REDUCED

    ( Cost reduction effectiveness : 30 % proven ) 

 

2) Slurry goes to spread out widely and thinly on the platen.

    ( No more waste for the slurry excessively. ) 

 

3) Pressure is all the same on each hole of nozzle.

   (Slurry comes out all the same flow rate for the multiple hole nozzle. ) 

 

 

 

4) Prevention of the slurry solidified.

   ( Easy to clean for the Nozzle ) 

 

 

5) Reliable reference tested

   ( Major companies has already tested it for the effectiveness. ) 

 

 

 

 

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Membership Grade

BUYER

Biz Pro VIP

SELLER

Biz Pro VIP
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