Surface Engineering Sputtering Target
Negotiable Min Order Quantity Unit
- Required Quantity
-
- Place of Origin
- Payment Terms
- Negotiable
- Production method
- Negotiable
- Shipping / Lead Time
- Negotiable / Negotiable
- Keyword
- alloy, nonferrous metal, precious metals, sputtering target
- Category
- Other Minerals & Metallurgy Products
China New Metal Materials Technology Co.,Ltd
- Country / Year Established
- China /
- Business type
- Others
- Verified Certificate
-
13
Product name | Surface Engineering Sputtering Target | Certification | - |
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Category | Other Minerals & Metallurgy Products | Ingredients | - |
Keyword | alloy , nonferrous metal , precious metals , sputtering target | Unit Size | - |
Brand name | - | Unit Weigh | - |
origin | Stock | - | |
Supply type | - | HS code | - |
Product Information
(CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display , architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.)
High purity metal sputtering target material (3N-6N): Aluminum target(Al), chromium target(Cr), copper target(Cu), nickel target(Ni), silicon target(Si), germanium target(Ge), niobium target(Nb), titanium target(Ti), indium target(In), silver target(Ag), tin target(Sn), graphite target, tantalum target(Ta), molybdenum target(Mo), gold target(Au), hafnium target(Hf), manganese target(Mn), zirconium target(Zr), magnesium target(Mg), zinc target(Zn), lead target(Pb), iridium target(Ir), yttrium target(Y), cerium target(Ce), lanthanum target(La), ytterbium target(Yb), gadolinium target(Gd), platinum target(Pt), etc..
High density ceramic target (3N-5N): ITO target, AZO target, IGZO target, magnesium oxide target(MgO), yttrium oxide target(Y2O3), iron oxide target(Fe2O3), nickel oxide target(Ni2O3), chromium oxide target(Cr2O3), zinc oxide target(ZnO), zinc sulfide target(ZnS), cadmium sulfide target(CdS), molybdenum disulfide target(MoS2), silicon dioxide target(SiO2), silicon monoxide target(SiO), zirconium dioxide target(ZrO2), niobium pentoxide target(Nb2O5), titanium dioxide(TiO2), hafnium oxide target(HfO2), titanium boride target(TiB2), zirconium diboride target(ZrB2), tungstic oxide target(WO3), aluminum oxide target(Al2O3), tantalum pentoxide target(Ta2O5), magnesium fluoride target(MgF2), zinc selenide target(ZnSe), aluminum nitride target(AlN), silicon nitride target(SiN), boron nitride target(BN), titanium nitride target(TiN), silicon carbide target(SiC), lithium niobate target(LiNbO3), praseodymium titanate target(PrTiO3), barium titanate target(BaTiO3), lanthanum titanate target(LaTiO3), and so on..
Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology—inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%.
In addition, CNM could provide with the metalizing process of the target and unbounded services.
High purity alloy sputtering target: nickel-vanadium alloy target(Ni-V), nickel-chromium target(Ni-Cr), titanium-aluminum alloy target(Ti-Al), silicon-aluminum alloy target(Si-Al), copper-indium alloy target(Cu-In), copper-gallium alloy target(Cu-Ga), copper-indium-gallium alloy target(Cu-In-Ga), copper-indium-gallium-selenium alloy target(Cu-In-Ga-Se), stainless steel target, zinc-aluminum alloy target(Zn-Al), tungsten-titanium alloy target(W-Ti), iron-cobalt alloy target(Fe-Co), etc.
Note: CNM product high purity alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%).
In addition, CNM provides with the metalizing process of the target materials and unbounded services.
- Product Info Attached File
B2B Trade
Price (FOB) | Negotiable | transportation | - |
---|---|---|---|
MOQ | Negotiable | Leadtime | Negotiable |
Payment Options | Negotiable | Shipping time | Negotiable |
- President
- Gao Junfeng
- Address
- Qinghe Zhongguancun Yongtai Innovation Park A-320, Haidian District, Beijing, China
- Product Category
- Industrial Supplies
- No. of Total Employees
- 51-100
- Company introduction
-
CNM has been blessed with advantages in R & D of all kinds of metal material, coating material, sputtering target material, functional alloy material and applied technology. Based on large technical power, CNM has developed many series of new materials, and about one hundred kinds of product brands have been applied widely in such industries like aviation and space, military project, infotronics, vacuum coating, magnetron sputtering, metallurgy, functional material, biological medicine and new energy. Now CNM has multiple production lines of coating material, sputtering target, metal material and high purity alloy, etc., with advanced production equipments and perfect craft.
At present our customers are wide spread in more than ten countries and districts like U.S., Europe, Japan, Korea, Taiwan and Hong Kong in China, covering over six hundred units including some famous enterprises and institutions of domestic and foreign military research and listed company.
- Main Markets
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Germany
Hong Kong(China)
India
Iran
Japan
South Korea
Taiwan
U. Kingdom
U.S.A
- Factory Information
-
China New Metal Materials Technology Co.,Ltd
- Main Product
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