Magnetron sputtering target
Negotiable Min Order Quantity Unit
- Required Quantity
-
- Place of Origin
- Payment Terms
- Negotiable
- Production method
- Negotiable
- Shipping / Lead Time
- Negotiable / Negotiable
- Keyword
- alloy, compounds, metal, sputtering target
- Category
- Industrial Supplies
China New Metal Materials Technology Co.,Ltd
- Country / Year Established
-
China
/
- Business type
- Others
- Verified Certificate
-
13
| Product name | Magnetron sputtering target | Certification | - |
|---|---|---|---|
| Category | Industrial Supplies | Ingredients | - |
| Keyword | alloy , compounds , metal , sputtering target | Unit Size | - |
| Brand name | - | Unit Weigh | - |
| origin | Stock | - | |
| Supply type | - | HS code | - |
Product Information
CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.
High pure metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc.
Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services.
High pure alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc
Note: CNM product high purity Alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%).
In addition, CNM provides with the metalizing process of the target materials and unbounded services.
B2B Trade
| Price (FOB) | Negotiable | transportation | - |
|---|---|---|---|
| MOQ | Negotiable | Leadtime | Negotiable |
| Payment Options | Negotiable | Shipping time | Negotiable |
- President
- Gao Junfeng
- Address
- Qinghe Zhongguancun Yongtai Innovation Park A-320, Haidian District, Beijing, China
- Product Category
- Industrial Supplies
- No. of Total Employees
- 51-100
- Company introduction
-
CNM has been blessed with advantages in R & D of all kinds of metal material, coating material, sputtering target material, functional alloy material and applied technology. Based on large technical power, CNM has developed many series of new materials, and about one hundred kinds of product brands have been applied widely in such industries like aviation and space, military project, infotronics, vacuum coating, magnetron sputtering, metallurgy, functional material, biological medicine and new energy. Now CNM has multiple production lines of coating material, sputtering target, metal material and high purity alloy, etc., with advanced production equipments and perfect craft.
At present our customers are wide spread in more than ten countries and districts like U.S., Europe, Japan, Korea, Taiwan and Hong Kong in China, covering over six hundred units including some famous enterprises and institutions of domestic and foreign military research and listed company.
- Main Markets
-
Germany
Hong Kong(China)
India
Iran
Japan
South Korea
Taiwan
U. Kingdom
U.S.A
- Factory Information
-
China New Metal Materials Technology Co.,Ltd
- Main Product
