300mm Ashing System (TERA 21)

300mm Ashing System (TERA 21)


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Keyword
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Other Machinery & Industry Equipment

Psk Inc.

Country / Year Established
South Korea South Korea / 2007
Business type
Manufacturer
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Product name 300mm Ashing System (TERA 21) Certification -
Category Other Machinery & Industry Equipment Ingredients -
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origin Stock -
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Product Information

Introduced in 1999 and designed for FEOL photoresist strip providing high productivity and low CoO/CoC performances. Featuring modular design of mainframe, it is consisted of standard two process chambers and max. three process chambers can be configured with. Each chamber processes two wafers at a time with high throughput.

TERA21 system uses two different robotic systems in order to transfer the wafers from FOUP to process chambers. The MASIC (Multi Axis Synchronized Interpolation Control) Robot in EFEM module and advanced four paddle robot in transfer module that provides ultimate robust hardware repeatability and production worthy in 300mm Ashing System. TERA21 system has shown reliable performance for one and half years in mass production

TERA21 system also provides photoresist popping free solution in high dose implanted process with ISBP ( In-situ Bake Process ) which is solely company patented.

The downstream microwave source delivers the excellent process control and damage free to the underlying exposed film.

OCR & Aligner is available to trace every wafer's ID thru Buffer Stage. Smart IN-Line Wafer Trace System dose not make any throughput loss.

TERA21 can provide Less CAPEX ,No Popping , Low Damage, Traceability and Reliability.

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Psk Inc.

Country / Year Established
South Korea South Korea / 2007
Business type
Manufacturer

16

TRADE TOWER

DUNS

President
Park, Kyong-soo
Address
2-12 Seoku-dong, Hwaseong-si, Gyeonggi-do
Product Category
Other Machinery & Industry Equipment
Year Established
2007
Company introduction

"Global Provider for Semiconductor Process Equipment"
During the past 20 years, our dedicated and passionate employees have worked diligently to transform PSK into a domestic leader, and in 2007 PSK finally achieved the #1 global position within our established segment of the semiconductor equipment industry.
We persevered with the IMF crisis of 1997, and were able to withstand the global financial crisis in recent years to emerge as an innovative leader driving future growth through:

1. Aggressive R&D Investments
2. Strategic Marketing
3. Strengthened Process Standardizations
4. Human Resource Development

We view the need for continued focus in these 4 areas, and strongly believe that recent declines in the industry's investment patterns will provide further opportunities for PSK.
2010 is a turning point for PSK to emerge as a "Global Provider for Semiconductor Process Equipment" through evolved and revolutionized technology that will be applied to newly developed products. We are extremely confident that these new opportunities will create the backbone of our next growth momentum.

PSK is developing an in-house HRD program customized to shed old processes and implement an improved HR Engine geared to foster next-generation leaders who will deliver "Growth Beyond Sustainability". This new HR Engine will create new products and business opportunities to help PSK emerge as a global leader within the semiconductor industry.

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China China

Japan Japan

Singapore Singapore

Taiwan Taiwan

U.S.A U.S.A

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