LiWZnO ceramic sputtering target
Negotiable Min Order Quantity Unit
- Required Quantity
-
- Place of Origin
- China
- Brand name
- TYR
- Payment Terms
- Negotiable
- Production method
- Negotiable
- Shipping / Lead Time
- Negotiable / Negotiable
- Category
- Other Chemicals , Oxide
Huizhou Tian Yi Rare Material Co.,Ltd
China
- Verified Certificate
-
10
| Product name | LiWZnO ceramic sputtering target | Certification | - |
|---|---|---|---|
| Category |
Other Chemicals
Oxide |
Ingredients | - |
| Keyword | sputtering target , thin film evaporator , ceramic target , liwzno target | Unit Size | - |
| Brand name | TYR | Unit Weigh | - |
| origin | China | Stock | - |
| Supply type | - | HS code | - |
Product Information
LiWZnO ceramic sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications
Purity: 99.9%
Comoposition: Li/W/ZnO=2/1.5/96.5at%
Spec.: Diameter: 355.6mm , 14", max. Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm, if larger size than this, we can do it as tiles joint by 45 degree or 90 degree.
Shape: discs, plate, rod, tube, sheet, Delta, Rotatable and per drawing
TYR material supply all kinds of ceramic sputtering target , compound semiconductor target include Oxide sputtering target , Fluoride sputtering target , Boride sputtering target , Carbide sputtering target , Nitride sputtering target , Sulfide sputtering target , Selenide sputtering target , Silicide sputtering target , Telluride sputtering target , Antimonide sputtering target , Arsenide sputtering target ......
The available made method include hot pressing , HP
TYR will base on each different material to select the best way to made it and sure the finish ceramic sputtering target to be best.
Oxide Ceramic sputtering target :
Aluminum Oxide , Al2O3 Antimony Oxide , Sb2O3
Antimony:Tin Dioxide , Sb:SnO, ATO Barium Titanate , BaTiO3
Bismuth Oxide , Bi2O3 Cerium oxide , CeO2
Cerium fluoride , CeF3 Chromium Oxide ,CrO, Cr2O3
Copper Oxide , CuO Dysprosium Oxide , Dy2O3
Erbium Oxide , Er2O3 Eur Oxide , Eu2O3
Gadolinium Oxide , Gd2O3 Hafnium Oxide, HfO2
Holmium Oxide , Ho2O3 Indium Tin Oxide, In2O3-SnO2, ITO
Indium Zinc Oxide, In2O3-ZnO, IZO Indium Oxide , In2O3
Indium Gallium Zinc Oxide, IGZO , In2O3+Ga2O3+ZnO
Iron Oxide , Fe2O3, Fe3O4 Lanthanum Aluminate , LaAl2O3,
LSMO , La0.67Sr0.33MnO3
Lead Zirconate , PbZrO3 Lead Oxide, PbO
Lead Titanate , PbTiO3 Lead Zirconate , PbZrO3
Lead Zirconate-Titanate, PZT , PbZrO3 + PbTiO3
Lutetium Oxide , Lu2O3
Magnesium Oxide , MgO Molybdenum Oxide , MoO
Molybdenum Oxide , MoO3, Neodymium Oxide , Nd2O3,
Nickel Oxide, NiO Niobium Pentoxide , Nb2O5, Nb2Ox
Neodymium Oxide , Nd2O3, Nickel Oxide, NiO
Praseodymium Oxide , Pr6O11, Samarium Oxide , Sm2O3
Scandium Oxide , Sc2O3 Silicon Monoxide , SiO
Silicon Dioxide , SiO2 Strontium Titanate , SrTiO3,
Tantalum Pentoxide , Ta2O5, Terbium Oxide , Tb4O7
Thulium Oxide , Tm2O3 Titanium Oxide , Ti2O3, Ti3O5
Titanium Monoxide , TiO Titanium Dioxide , TiO2
Tungsten Oxide , WO3, WO2.9, WO3 doped Li2O
Vanadium Pentoxide , V2O5, VO2 Yttrium Oxide , Y2O3
Ytterbium Oxide , Yb2O3
Zinc Oxide , ZnO Zinc Aluminum Oxide, AZO , Al2O3-ZnO, ZnO-Al
Ga2O3 doped ZnO , GZO Zirconium oxide , ZrO2
ZrO2 - Y2O3 stabilized , YSZ, ZrO2 + SiO2
Fluoride Ceramic sputtering target
Aluminum Fluoride , AlF3 target
Barium Fluoride , BaF2 target
Cadmium Fluoride , CdF2 target
Calcium Fluoride, CaF2 target
Cerium Fluoride , CeF3 target
Dysprosium Fluoride , DyF3 target
Erbium Fluoride , ErF3 target
Lanthanum Fluoride, LaF3 target
Lithium Fluoride , LiF target
Magnesium Fluoride, MgF2 target
Neodymium Fluoride, NdF3 target
Potassium Fluoride , KF, target
Praseodymium Fluoride , PrF3 target
Lead Fluoride , PbF2 target
Sodium Fluoride , NaF target
Strontium Fluoride , SrF3 target
Samarium Fluoride , SmF3 target
Cryolite Na3AlF6 target
Ytterbium Fluoride , YbF3 target
Yttrium Fluoride , YF3target
Boride Ceramic sputtering target
Chromium Boride , Cr2B, CrB2, CrB, Cr5B3 target
Hafnium Boride , HfB2 target
Iron Boride , FeB target
Lanthanum Boride , LaB6 target
Molybdenum Boride , Mo2B, Mo2B5 target
Neodymium Boride , NdB, NdB2 target
Tantalum Boride , TaB, TaB2 target
Titanium Boride, TiB2 target
Tungsten Boride , WB, WB2, W2B5 target
Vanadium Boride , VB, VB2 target
Zirconium Boride , ZrB2 target
Carbide Ceramic sputtering target
Boron Carbide, B4C target
Chromium Carbide , Cr3C2, CrC target
Hafnium Carbide, HfC target
Molybdenum Carbide , Mo2C target
Niobium Nitride , NbC target
Silicom Carbide , SiC target
Tantalum Carbide , TaC target
Titanium Carbide, TiC target
Titanium Carbon Nitride , TiCN target
Tungsten Carbide , W2C, WC target
Tungsten Carbide Doped with Nickel , WC+Ni target
Tungsten Carbide Doped with Cobalt , WC+Co target
Vanadium Carbide , VC target
Zirconium Carbide, ZrC target
Nitride Ceramic sputtering target
Aluminum Nitride , AlN target
Boron Nitride, BN target
Hafnium Nitride, HfN target
Niobium Niride , NbN target
Silicom Nitride , Si3N4 target
Tantalum Nitride , TaN target
Titanium Carbon nitride , TiCN target
Titanium Nitride, TiN target
Vanadium Nitride , VN target
Zirconium Nitride , ZrN target
Sulfide Ceramic sputtering target
Cadmium Sulfide , CdS target
Copper Sulfide, CuS,Cu2S target
Indium Sulfide , In2S3 target
Iron Sulfide, FeS, FeS2 target
Lead Sulfide , PbS target
Manganese Sulfide, MnS2 target
Molybdenum Sulfide , MoS2 target
Niobium Sulfide , NbS2 target
Silver Sulfide , AgS. Ag2S target
Tantalum Suflfide , TaS2 target
Tin Sulfide , SnS, SnS2 target
Tungsten Sulfide , WS2 target
Zinc Sulfide , ZnS target
Silicide Ceramic sputtering target
Chromium Silicide , CrSi2 target
Cobalt Silicide , Co3Si target
Hafnium Silicide , HfSi2 target
Molybdenum silicide, MoSi2, Mo5Si3 target
Nickel Silicide , NiSi target
Niobium Silicide , Nb5Si3, NbSi2 target
Tantalum Silicide , Ta5Si3, TaSi2 target
Titanium silicide, Ti5Si3, TiSi2 target
Tungsten Silicide , WSi2 target
Vanadium silicide , V3Si, VSi2 target
Zirconium Silicide , ZrSi2 target
Selenide Ceramic sputtering target
Aluminum Selenide , Al2Se3 target
Antimony Selenide , Sb2Se3 target
Arsenic Selenide , As2Se3 target
Bismuth Selenide, Bi2Se3 target
Cadmium Selenide , CdSe target
Copper Selenide, CuSe, Cu2Se target
Gallium Selenide, Ga2Se3 target
Gernium Selenide, GeSe target
Indium Selenide, In2Se3 target
Lead Selenide, PbSe target
Molybdenum Selenide, MoSe2 target
Manganese Selenide, MnSe target
Niobium Selenide , NbSe2 target
Tantalum Selenide , TaSe2 target
Tungsten Selenide , WSe2 target
Zinc Selenide , ZnSe target
Antimonide sputtering target
Indium Antimonide , InSb target
Gallium Antimonide , GaSb target
Nickel Antimonide , NiSb target
Arsenide sputtering target
Indium Arsenide , InAs target
Tin Arsenide , SnAs target
Gallium Arsenide , GaAs target
Telluride sputtering target
Arsenic Telluride , As2Te3 target
Antimony Telluride, SbTe, Sb2Te3 target
Bismuth Telluride , Bi2Te3, BiTe target
Bismuth Antimony Telluride , Bi-Sb-Te target
Cadmium Telluride, CdTe target
Copper Telluride , CuTe, Cu2Te target
Gallium Telluride , GaTe target
Geranium Telluride , GeTe target
Geranium Antimony Telluride , Ge-Sb-Te target
Lead Telluride , PbTe target
Tin Telluride, SnTe target
Molybdenum Telluride, MoTe2 target
Niobium Telluride, NbTe2 target
Silver Telluride, Ag2Te target
Tantalum Telluride, TaTe2 target
Tungsten Telluride , WTe2, sputtering target
Zinc Telluride , ZnTe target
B2B Trade
| Price (FOB) | Negotiable | transportation | - |
|---|---|---|---|
| MOQ | Negotiable | Leadtime | Negotiable |
| Payment Options | Negotiable | Shipping time | Negotiable |
- President
- Amy Chiu
- Address
- 12 K of Shiji, Shijixingtian Bldg, YanDa Road, Huizhou, China
- Product Category
- Industrial Supplies,Other Minerals & Metallurgy Products,Semiconductors
- No. of Total Employees
- 1-50
- Company introduction
-
TYR has been established in 2004 year, specializes in a wide category of sputtering targets, evaporation source material, rare earth material and chemistry reagent, PVD materials base on metals, alloys, compounds. we offer targets bonding service, we serving government research establishments, universities and high technology industries. We using a variety of specialized processes including hot pressing, hot/cold isostatic pressing, and vacuum melting, vacuum sintering, we can provide the kind of homogenous, fine-grained, high-density materials that conform to the strictest quality control, we always aim to put quality first. Our product list include Metal sputtering targets, Alloy sputtering targets, Noble metal sputtering targets, Noble alloy sputtering targets, Oxide Ceramic Sputtering targets, Boride Ceramic Sputtering Targets, Carbide Ceramic Sputtering Targets, Fluoride Ceramic Sputtering Targets, Nitride Ceramic Sputtering Targets, Sulfide Ceramic Sputtering Targets, Selenide Ceramic Sputtering Targets, Silicide Ceramic Sputtering Targets, Telluride Ceramic Sputtering Targets, metal evaporation source, alloy evaporation source, optical thin film coating material, rare earth oxide and each high pure chemistry reagent. Sputtering Targets Materials list: High Pure Metal Sputtering Targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper (Cu), Dysprosium (Dy), Erbium (Er), Eur (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), Lanthanum (La), Lead (Pb), Lutetium (Lu), Manganese (Mn), Molybdenum (Mo), Magnesium (Mg), Neodymium (Nd), Niobium (Nb), Nickel (Ni), Palladium (Pd), Platinum (Pt), Praseodymium (Pr), Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc), Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn) ; Alloy Sputtering Targets: Al alloy targets, Al-Cu, Al-Cr, Al-Nd, Al-Si, Al-Si-Cu, Al-Ag Cu alloy targets: Cu-Ag, Cu-Co, Cu-Ga, Cu-In, Cu-Ni Co alloy targets: Co-Cr, Co-Cr-Mo, Co-Fe, Co-Fe-B ,Co-Ni, Co-Ni-Cr, Co-Pt Ni alloy targets: Ni-Al, Ni-Cr, Ni-Cr-Si, Ni-Fe, Ni-Mn, Ni-Ti, Ni-V, Ti alloy targets: Ti-Al, Ti-Ni, Ti-Zr, Ti-Co Ta alloy targets: Ta-Al, Ta-W W alloy targets: W-Ti, W-Mo, W-B, W-Re Mo alloy targets: Mo-Nb, Mo-Si, Mo-Al Fe alloy targets: Fe-B, Fe-Co, Fe-Mn, Fe-Hf, Fe-Gd, Fe-Tb Zr alloy targets: ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, Noble alloy targets: Au-Ag, Ag-Cu, Ir-Mn, Ir-Re, Ir-Ru, Au-Sn, Ag-In, Ag-Sn e.t.c Ceramic sputtering target: Oxide Ceramic Sputtering targets: Al2O3, AZO, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, In2O3-SnO2 (ITO), Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu2O3, MgO, MoO3, Nd2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, Tm2O3, TiO, TiO2, Ti3O5, Ti2O3, SnO2, SnO, WO3, WO3-Li, V2O5, VO2, Yb2O3, Y2O3, Y2O3-ZrO2 (YSZ), YBCO, ZnO, ZnO:Al, ZnO-In2O3, ZrO2, ZrO2-5-15wt%CaO) Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, TaB2, TiB2, W2B5, WB, VB, YB6, ZrB2 Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Ceramic Sputtering Targets : AlF3, BaF2, CaF2, LiF, MgF2, NaF, Na3AlF6, YF3, YbF3 Nitride Ceramic Sputtering Targets :AlN, BN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Sulfide Ceramic Sputtering Targets: CuS, Cu2S, CdS, FeS, FeS2, GeS, SnS, In2S3, MoS2, TaS2, WS2, ZnS Selenide Ceramic Sputtering Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Silicide Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Telluride Ceramic Sputtering Targets: Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, WTe2, ZnTe
- Main Markets
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Egypt
France, Metropolitan
Germany
Hong Kong(China)
India
Japan
South Korea
U. Kingdom
U.S.A
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