LiWZnO ceramic sputtering target

LiWZnO ceramic sputtering target


Negotiable Min Order Quantity Unit

Required Quantity
Place of Origin
China
Brand name
TYR
Payment Terms
Negotiable
Production method
Negotiable
Shipping / Lead Time
Negotiable / Negotiable
Keyword
sputtering target, thin film evaporator, ceramic target, liwzno target
Category
Other Chemicals , Oxide

Huizhou Tian Yi Rare Material Co.,Ltd

Membership
BIZ
Country / Year Established
China China /
Business type
Others
Verified Certificate

10

Product name LiWZnO ceramic sputtering target Certification -
Category Other Chemicals
Oxide
Ingredients -
Keyword sputtering target , thin film evaporator , ceramic target , liwzno target Unit Size -
Brand name TYR Unit Weigh -
origin China Stock -
Supply type - HS code -

Product Information

LiWZnO ceramic sputtering target with the highest possible density and smallest  possible average grain sizes for  use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications 

Purity: 99.9%

Comoposition: Li/W/ZnO=2/1.5/96.5at% 

 

 

Spec.: Diameter: 355.6mm , 14",  max. Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm, if larger size than this, we can do it as tiles joint by 45 degree or 90 degree.

Shape:  discs, plate, rod, tube, sheet, Delta, Rotatable and per drawing

 

 

TYR material supply all kinds of ceramic sputtering target , compound semiconductor target include Oxide sputtering target , Fluoride sputtering target , Boride sputtering target , Carbide sputtering target , Nitride sputtering target , Sulfide sputtering target , Selenide sputtering target , Silicide sputtering target , Telluride sputtering target , Antimonide sputtering target , Arsenide sputtering target ...... 

The available made method include hot pressing , HP


TYR will base on each different material to select the best way to made it and sure the finish ceramic sputtering target  to be best. 

 

Oxide Ceramic sputtering target :

Aluminum  Oxide , Al2O3             Antimony  Oxide , Sb2O3      

Antimony:Tin Dioxide , Sb:SnO, ATO    Barium Titanate , BaTiO3    

Bismuth Oxide , Bi2O3               Cerium oxide , CeO2        

Cerium fluoride , CeF3               Chromium Oxide ,CrO, Cr2O3     

Copper Oxide , CuO                 Dysprosium Oxide , Dy2O3    

Erbium Oxide , Er2O3               Eur  Oxide , Eu2O3 

Gadolinium Oxide , Gd2O3           Hafnium Oxide, HfO2      

Holmium Oxide , Ho2O3             Indium Tin Oxide, In2O3-SnO2, ITO       

Indium Zinc Oxide, In2O3-ZnO, IZO   Indium Oxide , In2O3       

Indium Gallium Zinc Oxide, IGZO , In2O3+Ga2O3+ZnO        

Iron Oxide , Fe2O3, Fe3O4           Lanthanum Aluminate , LaAl2O3,     

LSMO ,  La0.67Sr0.33MnO3       

Lead  Zirconate , PbZrO3            Lead Oxide, PbO    

Lead Titanate , PbTiO3                Lead Zirconate , PbZrO3       

Lead Zirconate-Titanate, PZT , PbZrO3 + PbTiO3    

Lutetium Oxide , Lu2O3  

Magnesium Oxide , MgO              Molybdenum Oxide , MoO

Molybdenum Oxide , MoO3,            Neodymium Oxide , Nd2O3,      

Nickel Oxide, NiO                    Niobium Pentoxide , Nb2O5, Nb2Ox   

Neodymium Oxide , Nd2O3,            Nickel Oxide, NiO     

Praseodymium Oxide , Pr6O11,          Samarium Oxide , Sm2O3      

Scandium Oxide , Sc2O3                Silicon Monoxide , SiO  

Silicon Dioxide , SiO2                  Strontium Titanate , SrTiO3,      

Tantalum Pentoxide , Ta2O5,            Terbium Oxide , Tb4O7    

Thulium Oxide , Tm2O3               Titanium Oxide , Ti2O3, Ti3O5 

Titanium Monoxide , TiO                Titanium Dioxide , TiO2  

Tungsten Oxide , WO3, WO2.9, WO3 doped Li2O   

Vanadium Pentoxide , V2O5, VO2        Yttrium Oxide , Y2O3   

Ytterbium Oxide , Yb2O3       

Zinc Oxide , ZnO                     Zinc Aluminum Oxide, AZO , Al2O3-ZnO, ZnO-Al

Ga2O3 doped ZnO , GZO               Zirconium oxide , ZrO2      

ZrO2 - Y2O3 stabilized , YSZ,           ZrO2 + SiO2

 

Fluoride Ceramic sputtering target    

Aluminum Fluoride , AlF3 target      

Barium Fluoride , BaF2 target    

Cadmium Fluoride , CdF2 target       

Calcium Fluoride, CaF2 target      

Cerium Fluoride , CeF3 target    

Dysprosium Fluoride , DyF3 target 

Erbium Fluoride , ErF3 target       

Lanthanum  Fluoride, LaF3 target      

Lithium Fluoride , LiF target  

Magnesium Fluoride, MgF2 target    

Neodymium Fluoride, NdF3 target     

Potassium Fluoride , KF, target       

Praseodymium Fluoride , PrF3 target      

Lead Fluoride , PbF2 target    

Sodium Fluoride , NaF target     

Strontium Fluoride , SrF3 target     

Samarium Fluoride , SmF3 target 

Cryolite Na3AlF6 target        

Ytterbium  Fluoride , YbF3 target      

Yttrium Fluoride , YF3target 

 

Boride Ceramic sputtering target    

Chromium Boride , Cr2B, CrB2, CrB, Cr5B3 target       

Hafnium Boride , HfB2 target       

Iron Boride , FeB target       

Lanthanum Boride , LaB6 target       

Molybdenum Boride , Mo2B, Mo2B5 target       

Neodymium Boride , NdB, NdB2 target       

Tantalum Boride , TaB, TaB2 target       

 Titanium Boride, TiB2 target       

Tungsten Boride , WB, WB2, W2B5 target       

Vanadium Boride , VB, VB2 target       

 Zirconium Boride , ZrB2 target   

 

Carbide Ceramic sputtering target   

Boron Carbide, B4C target     

Chromium Carbide , Cr3C2, CrC target      

Hafnium Carbide, HfC target     

Molybdenum Carbide , Mo2C target      

Niobium Nitride , NbC target     

Silicom Carbide , SiC target      

Tantalum Carbide , TaC target      

Titanium Carbide, TiC target     

Titanium Carbon Nitride , TiCN target        

Tungsten Carbide , W2C, WC target       

Tungsten Carbide Doped with Nickel , WC+Ni target      

Tungsten Carbide Doped with Cobalt , WC+Co target       

Vanadium Carbide , VC target     

Zirconium Carbide, ZrC target  

 

Nitride Ceramic sputtering target   

Aluminum Nitride , AlN target     

Boron Nitride, BN target    

Hafnium Nitride, HfN target      

Niobium Niride , NbN target       

Silicom Nitride , Si3N4 target       

Tantalum Nitride , TaN target       

 Titanium Carbon nitride , TiCN target     

Titanium Nitride, TiN target      

Vanadium Nitride , VN target      

Zirconium Nitride , ZrN target 

     

Sulfide Ceramic sputtering target  

Cadmium  Sulfide , CdS target       

Copper Sulfide, CuS,Cu2S target       

Indium Sulfide , In2S3 target       

Iron Sulfide, FeS, FeS2 target       

Lead Sulfide , PbS target       

Manganese Sulfide, MnS2 target       

Molybdenum Sulfide , MoS2 target       

Niobium Sulfide , NbS2 target       

Silver Sulfide , AgS. Ag2S target       

Tantalum Suflfide , TaS2 target       

Tin Sulfide , SnS, SnS2 target       

Tungsten Sulfide , WS2 target       

Zinc Sulfide , ZnS target   

 

Silicide Ceramic sputtering target   

Chromium Silicide , CrSi2 target       

Cobalt Silicide , Co3Si target       

Hafnium Silicide , HfSi2 target       

Molybdenum silicide, MoSi2, Mo5Si3 target       

Nickel Silicide , NiSi target       

Niobium Silicide , Nb5Si3, NbSi2 target       

Tantalum Silicide , Ta5Si3, TaSi2 target       

Titanium silicide, Ti5Si3, TiSi2 target       

Tungsten Silicide , WSi2 target       

Vanadium silicide , V3Si, VSi2 target       

Zirconium Silicide , ZrSi2 target      

 

Selenide Ceramic sputtering target   

Aluminum Selenide , Al2Se3 target       

Antimony Selenide , Sb2Se3 target       

Arsenic Selenide , As2Se3 target       

Bismuth Selenide,  Bi2Se3 target       

Cadmium Selenide , CdSe target       

Copper Selenide, CuSe, Cu2Se target       

Gallium Selenide, Ga2Se3 target       

Gernium Selenide, GeSe  target       

Indium Selenide, In2Se3 target       

Lead Selenide, PbSe target       

Molybdenum Selenide, MoSe2 target       

Manganese Selenide, MnSe target       

Niobium Selenide , NbSe2 target       

Tantalum Selenide , TaSe2 target       

Tungsten Selenide , WSe2 target       

Zinc Selenide , ZnSe target   

 

Antimonide sputtering target  

Indium Antimonide , InSb target      

Gallium Antimonide , GaSb target       

Nickel Antimonide , NiSb target   

 

Arsenide sputtering target   

Indium Arsenide , InAs target       

Tin Arsenide , SnAs target       

Gallium Arsenide , GaAs target       

 

Telluride sputtering target   

Arsenic Telluride , As2Te3 target      

Antimony Telluride, SbTe, Sb2Te3 target       

Bismuth Telluride , Bi2Te3, BiTe target  

Bismuth Antimony Telluride , Bi-Sb-Te target 

Cadmium Telluride, CdTe target       

Copper Telluride , CuTe, Cu2Te target      

Gallium Telluride , GaTe target       

Geranium Telluride , GeTe target      

Geranium Antimony Telluride , Ge-Sb-Te target       

Lead Telluride , PbTe target   

Tin Telluride, SnTe target

Molybdenum Telluride, MoTe2 target       

Niobium Telluride, NbTe2 target       

Silver Telluride, Ag2Te target      

Tantalum Telluride, TaTe2 target       

Tungsten Telluride , WTe2, sputtering target       

Zinc Telluride , ZnTe target 

 

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Huizhou Tian Yi Rare Material Co.,Ltd

Country / Year Established
China China /
Membership
BIZ
Business type
Others

10

President
Amy Chiu
Address
12 K of Shiji, Shijixingtian Bldg, YanDa Road, Huizhou, China
Product Category
Industrial Supplies,Other Minerals & Metallurgy Products,Semiconductors
No. of Total Employees
1-50
Company introduction
TYR has been established in 2004 year, specializes in a wide category of sputtering targets, evaporation source material, rare earth material and chemistry reagent, PVD materials base on metals, alloys, compounds. we offer targets bonding service, we serving government research establishments, universities and high technology industries. We using a variety of specialized processes including hot pressing, hot/cold isostatic pressing, and vacuum melting, vacuum sintering, we can provide the kind of homogenous, fine-grained, high-density materials that conform to the strictest quality control, we always aim to put quality first. Our product list include Metal sputtering targets, Alloy sputtering targets, Noble metal sputtering targets, Noble alloy sputtering targets, Oxide Ceramic Sputtering targets, Boride Ceramic Sputtering Targets, Carbide Ceramic Sputtering Targets, Fluoride Ceramic Sputtering Targets, Nitride Ceramic Sputtering Targets, Sulfide Ceramic Sputtering Targets, Selenide Ceramic Sputtering Targets, Silicide Ceramic Sputtering Targets, Telluride Ceramic Sputtering Targets, metal evaporation source, alloy evaporation source, optical thin film coating material, rare earth oxide and each high pure chemistry reagent. Sputtering Targets Materials list: High Pure Metal Sputtering Targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper (Cu), Dysprosium (Dy), Erbium (Er), Eur (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), Lanthanum (La), Lead (Pb), Lutetium (Lu), Manganese (Mn), Molybdenum (Mo), Magnesium (Mg), Neodymium (Nd), Niobium (Nb), Nickel (Ni), Palladium (Pd), Platinum (Pt), Praseodymium (Pr), Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc), Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn) ; Alloy Sputtering Targets: Al alloy targets, Al-Cu, Al-Cr, Al-Nd, Al-Si, Al-Si-Cu, Al-Ag Cu alloy targets: Cu-Ag, Cu-Co, Cu-Ga, Cu-In, Cu-Ni Co alloy targets: Co-Cr, Co-Cr-Mo, Co-Fe, Co-Fe-B ,Co-Ni, Co-Ni-Cr, Co-Pt Ni alloy targets: Ni-Al, Ni-Cr, Ni-Cr-Si, Ni-Fe, Ni-Mn, Ni-Ti, Ni-V, Ti alloy targets: Ti-Al, Ti-Ni, Ti-Zr, Ti-Co Ta alloy targets: Ta-Al, Ta-W W alloy targets: W-Ti, W-Mo, W-B, W-Re Mo alloy targets: Mo-Nb, Mo-Si, Mo-Al Fe alloy targets: Fe-B, Fe-Co, Fe-Mn, Fe-Hf, Fe-Gd, Fe-Tb Zr alloy targets: ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, Noble alloy targets: Au-Ag, Ag-Cu, Ir-Mn, Ir-Re, Ir-Ru, Au-Sn, Ag-In, Ag-Sn e.t.c Ceramic sputtering target: Oxide Ceramic Sputtering targets: Al2O3, AZO, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, In2O3-SnO2 (ITO), Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu2O3, MgO, MoO3, Nd2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, Tm2O3, TiO, TiO2, Ti3O5, Ti2O3, SnO2, SnO, WO3, WO3-Li, V2O5, VO2, Yb2O3, Y2O3, Y2O3-ZrO2 (YSZ), YBCO, ZnO, ZnO:Al, ZnO-In2O3, ZrO2, ZrO2-5-15wt%CaO) Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, TaB2, TiB2, W2B5, WB, VB, YB6, ZrB2 Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Ceramic Sputtering Targets : AlF3, BaF2, CaF2, LiF, MgF2, NaF, Na3AlF6, YF3, YbF3 Nitride Ceramic Sputtering Targets :AlN, BN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Sulfide Ceramic Sputtering Targets: CuS, Cu2S, CdS, FeS, FeS2, GeS, SnS, In2S3, MoS2, TaS2, WS2, ZnS Selenide Ceramic Sputtering Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Silicide Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Telluride Ceramic Sputtering Targets: Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, WTe2, ZnTe
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