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SiH2Cl2 Dichlorosilane

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Category: Other Chemicals

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OCI Materials

Country / Year Established: South Korea / 1997

Business type: Manufacturer

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DUNS

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Product name	SiH2Cl2 Dichlorosilane	Certification	-
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Product Information

"Something Different! So Different!"
SiH2Cl2 Dichlorosilane

♦ Application

-SiH2Cl2 is silicon precursor gas used in combination with ammonia for silicon nitride chemical vapor deposition (CVD). SiH2Cl2 is also used for epitaxial silicon deposition.

♦ Specification

		Specification	Analyzer
Purity	SiH2Cl2	99.9%
Impurity (ppmv)	O2 + Ar	≤ 1.0	GC
	N2	≤ 1.0	GC
	CO	≤ 1.0	GC
	CO2	≤ 1.0	GC
	CH4	≤ 1.0	GC
	HC	≤ 10.0	GC
	SiH3Cl	≤ 500	GC
	SiHCl3	≤ 500	GC
	SiCl4	≤ 500	GC

♦ Package

Type	Material	Filling Weight (Max.)	Valve Connection Type
40L	SUS 316L	37kg	JIS 22-14L DISS 636
10L	SUS 316L	9kg	JIS 22-14L DISS 636

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OCI Materials

Minisite Heart

Country / Year Established: South Korea / 1997

Business type: Manufacturer

TRADE TOWER

DUNS

President: Min-gyu Lim

Address: 60-5 Sangjool-dong, Yeongjoo-si, Gyeongsangbuk-do

Product Category: Other Chemicals

Year Established: 1997

No. of Total Employees: 101-500

Company introduction: OCI Materials is the first Korean merchant manufacturer to develop and supply specialty gases such as NF3, WF6, SiH4, and SiH2Cl2 for semiconductors, TFT-LCD and solar cells; all of which are closely associated with the electronic industry.