In-line Sputter System :

In-line Sputter System is equipment for coating a thin film on a flat substrate, such as Glass, in vacuum chamber and It is have a optimal competitive at continuous mass production.

System Type : Vertical & Horizontal Type

Substrate Size : Customer request (Max. 8.5G - 2200mm*2600mm)

Target : ITO, SiO2,TiO2, Nb2O5, AZO,AlN, Cu, Mo, AI, Ag, Cr, NiCr, NiCu etc.

            (Metal, Oxide, Nitride, Carbide) 

Roll To Roll Sputter System :

Roll To Roll System (Web coate)r is a coating equipment for functional film manufacturing, such as flexible display film (PET, PEN, PI, PC etc).
High speed deposition is possible while maintaining thickness of the deposition layer on top of a thin film.

System Type : 1 Drum Type (Max. 6 Dual Cathode)

                     2 Drum Type (Max. 12 Dual Cathode)

Substrate Size : Customer request (Film width max.1,600mm commercialization)

Batch Type Sputter System :

Batch Type System is type to built the substrate inside single chamber.
This system is advantageous in short-run production and provides a significant cost reduction effect.

System Type : Vertical & Horizontal Type

Substrate Size : Customer request

 Application :

ITO Coating for Touch Panel,   Metal Coating for Electrode,   Filter Coating for PDP

TCO Coating for Solar Cell,   Case Decoration of Mobile phone,   EMI Shield Coating
Optical Coating,   Large area glass Coating,   Mirror & Lamp Coating in Automotive

AR / AG / Low-e Coating, etc

Vacuum Film Dry Conditioner System :

Cathode Design, Chamber Design :

PLC, HMI, Full Auto Control & Monitoring System :